Disclosed is a method for the fabrication of polymeric topcoat via initiated chemical vapor deposition (iCVD) or photoinitiated chemical vapor deposition (piCVD) in conjunction with directed self-assembly (DSA) of block copolymers to generate high resolution patterns. A topcoat deposited by iCVD or piCVD allows for conformal, ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD topcoat enables the use of a diversity of block copolymer (BCP) materials for DSA and facilitates the direct and seamless integration of the topcoats for a pattern transfer process.
Details
Title
Method of Forming Topcoat for Patterning
Inventors
Kim, Do Han : Massachusetts Institute of Technology Suh, Hyo Seon : University of Chicago Moni, Priya : Massachusetts Institute of Technology Gleason, Karen K. : Massachusetts Institute of Technology Nealey, Paul Franklin : University of Chicago
Applicants
Massachusetts Institute of Technology University of Chicago
Content Type
Patent
Assignees
Massachusetts Institute of Technology University of Chicago