Published November 2, 2004
| Version v1
Patent
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Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices
Creators
- 1. University of Chicago
Description
MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.
Files
US6811612.pdf
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Additional details
Identifiers
- Patent number
- US 16987902 A
- Patent application number
- US 6811612 B2
- Other
- oai:uchicago.tind.io:8778
Dates
- Patent filed
-
2002-11-08