Published November 2, 2004 | Version v1
Patent Open

Patterning of nanocrystalline diamond films for diamond microstructures useful in MEMS and other devices

Description

MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.

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Additional details

Identifiers

Patent number
US 16987902 A
Patent application number
US 6811612 B2
Other
oai:uchicago.tind.io:8778

Dates

Patent filed
2002-11-08

UChicago Information

Division(s)
Physical Sciences Division
Department(s)
Physics