Published April 23, 1996 | Version v1
Patent Open

Simultaneous specimen and stage cleaning device for analytical electron microscope

  • 1. University of Chicago

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Patent applicant:

Patent assignee:

Description

An improved method and apparatus are provided for cleaning both a specimen stage, a specimen and an interior of an analytical electron microscope (AEM). The apparatus for cleaning a specimen stage and specimen comprising a plasma chamber for containing a gas plasma and an air lock coupled to the plasma chamber for permitting passage of the specimen stage and specimen into the plasma chamber and maintaining an airtight chamber. The specimen stage and specimen are subjected to a reactive plasma gas that is either DC or RF excited. The apparatus can be mounted on the analytical electron microscope (AEM) for cleaning the interior of the microscope.

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Additional details

Identifiers

Patent application number
US 52261895 A
Patent number
US 5510624 A
Other
oai:uchicago.tind.io:9407

Dates

Patent filed
1995-09-01

UChicago Information

Division(s)
Physical Sciences Division
Department(s)
Physics
Center(s) or Institute(s)
Computational Institute