Published November 23, 1999 | Version v1
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Smooth diamond films as low friction, long wear surfaces

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Description

An article and method of manufacture of a nanocrystalline diamond film. The nanocrystalline film is prepared by forming a carbonaceous vapor, providing an inert gas containing gas stream and combining the gas stream with the carbonaceous containing vapor. A plasma of the combined vapor and gas stream is formed in a chamber and fragmented carbon species are deposited onto a substrate to form the nanocrystalline diamond film having a root mean square flatness of about 50 nm deviation from flatness in the as deposited state.

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Additional details

Identifiers

Patent application number
US 62093296 A
Patent number
US 5989511 A
Other
oai:uchicago.tind.io:8759

Dates

Patent filed
1996-03-22

UChicago Information

Division(s)
Physical Sciences Division
Department(s)
Physics