Published November 23, 1999
| Version v1
Patent
Open
Smooth diamond films as low friction, long wear surfaces
Creators
- 1. University of Chicago
- 2. Argonne National Laboratory
Description
An article and method of manufacture of a nanocrystalline diamond film. The nanocrystalline film is prepared by forming a carbonaceous vapor, providing an inert gas containing gas stream and combining the gas stream with the carbonaceous containing vapor. A plasma of the combined vapor and gas stream is formed in a chamber and fragmented carbon species are deposited onto a substrate to form the nanocrystalline diamond film having a root mean square flatness of about 50 nm deviation from flatness in the as deposited state.
Files
US5989511.pdf
Files
(2.5 MB)
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Additional details
Identifiers
- Patent application number
- US 62093296 A
- Patent number
- US 5989511 A
- Other
- oai:uchicago.tind.io:8759
Dates
- Patent filed
-
1996-03-22