Published March 23, 2006 | Version v1
Patent Open

High power, long focus electron source for beam processing

  • 1. University of Chicago

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Description

Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.

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Additional details

Identifiers

Patent number
US 14341705 A
Patent application number
US 2006/0061285 A1
Other
oai:uchicago.tind.io:9011

Dates

Patent filed
2005-06-02

UChicago Information

Division(s)
Physical Sciences Division
Department(s)
Physics