Published March 23, 2006
| Version v1
Patent
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High power, long focus electron source for beam processing
Description
Beam processing methods including e-beam welding and e-beam evaporation for thin film deposition are implemented with a novel high power, long focus electron source. The high power, long focus electron source generates an e-beam. The e-beam is transported through a series of steering magnets to steer the beam. At least one refocusing magnet is provided to refocus the e-beam. A final steering magnet bends the e-beam to focus on a target, such as a weld joint or a deposition target.
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Additional details
Identifiers
- Patent number
- US 14341705 A
- Patent application number
- US 2006/0061285 A1
- Other
- oai:uchicago.tind.io:9011
Dates
- Patent filed
-
2005-06-02