Direct-Write Gas-Phase Deposition of Thin Films

The last 80 years of rapid progress in nanofabrication were defined by continually improving process control in lithography, deposition and etch. Year after year, these improvements have pushed forward the power of compute. However, we are approaching the point in which these techniques will reach their absolute limit. The ability to continue improve the capabilities of microelectronics and to push resolution to the atomic limit will require new strategies in nanofabrication. One prospective strategy which may allow this is direct-write. In this work, we developed a novel tool for direct-write vapor deposition (DW-VD). It is our aim that DW-VD can address these needs in two primary objectives: 1) in meeting emerging needs in microelectronics (such as three-dimensional device, patterning on substrates not compatible with conventional lithography, and autonomous fabrication) and 2) in achieving single molecule level resolution.