@article{PATENT,
      recid = {7923},
      title = {Method of Forming Topcoat for Patterning},
      number = {PATENT},
      month = {May},
      year = {2018},
      abstract = {Disclosed is a method for the fabrication of polymeric  topcoat via initiated chemical vapor deposition (iCVD) or  photoinitiated chemical vapor deposition (piCVD) in  conjunction with directed self-assembly (DSA) of block  copolymers to generate high resolution patterns. A topcoat  deposited by iCVD or piCVD allows for conformal,  ultra-thin, uniform, pinhole-free coatings. iCVD or piCVD  topcoat enables the use of a diversity of block copolymer  (BCP) materials for DSA and facilitates the direct and  seamless integration of the topcoats for a pattern transfer  process.},
      url = {http://knowledge.uchicago.edu/record/7923},
}